Product Introduction: Isophthalic Dihydrazide (CAS: 2760-98-7)

Finetech Industry Limited proudly supplies high-quality Isophthalic Dihydrazide, boasting a purity of 99% and presented as an off-white powder. With exceptional chemical stability and a broad range of industrial applications, this product serves as a key intermediate in various synthetic processes and functional materials.📦 Product Features:CAS Number: 2760-98-7Molecular Formula: C8H10N4O2Purity: ≥99%Appearance: Off-white powderPackaging: 25kg/drum or customized as per client requirements✅ Applications:Coatings and Inks Industry:Isophthalic Dihydrazide acts as a crosslinking agent and curing a [...]

Methyl 2,5,6-Trichloropyrimidine-4-carboxylate,Cas:89284-85-5: A Versatile Chemical Compound

Methyl 2,5,6-Trichloropyrimidine-4-carboxylate 89284-85-5: A Versatile Chemical Compound | Available at Finetech Industry LimitedIntroduction:Methyl 2,5,6-trichloropyrimidine-4-carboxylate is a chemical compound known for its versatility and wide-ranging applications. At FINETECH Industry Limited, we offer this compound to meet the diverse needs of industries. This article provides an overview of methyl 2,5,6-trichloropyrimidine-4-carboxylate, including its structure, synthesis methods, and potential applications, highlighting how you can contact us for your requirements.Chemical Structure:Met [...]

Allylthiourea: A Promising Compound for Scar Reduction and Cosmetic Applications

Introduction:Allylthiourea, also known as allylthiourea or 2-allylthiourea, is a versatile compound with a wide range of applications. In addition to its role as an intermediate in organic synthesis and metal plating, allylthiourea has gained significant attention for its remarkable properties in scar reduction and cosmetic formulations. This article highlights the potential of allylthiourea in addressing skin scars and its incorporation into cosmetic products for improving skin appearance.Scar Reduction: Allylthiourea has shown promising results in scar reduction, particularly in the field o [...]